RSSEvent00001129

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Event Info [ Edit ]
Name Metal Gate / High-k Dielectric Stacks for Advanced MOS Devices
Start time Thu, July 16, 2009 11:00 AM
End time Thu, July 16, 2009 12:00 PM
Building Low ,room 3051
Event type
Part of


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[edit] Event Location details

Location name: Low Center for Industrial Innovation (It has alternative name(s): CII, Low, Low Center for Industrial Inn., Low Center for Industrial Innovation, homepage of the location: http://map.rpi.edu/index.php/Low_Center_for_Industrial_Innovation)

[edit] Event Description

Prof. Moshe Eizenberg Technion ? Israel Institute of Technology, Haifa, Israel

The presentation will include the following subjects: 1) epitaxial gate oxides ? growth, leakage current, transport of carriers; 2) band alignment dependence on dielectric composition; 3) determination of the Effective Work Function; 4) tuning the Effective Work Function by nitriding the metal electrode; and 5) the thermal stability of gate stacks.


Facts about RSSEvent00001129RDF feed
Has end time 16 July 2009 12:00  +
Has location Low  +
Has room 3051  +
Has start time 16 July 2009 11:00  +
Has title Metal Gate / High-k Dielectric Stacks for Advanced MOS Devices  +
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